Atomic Scale in Microelectronics
Process, Materials, and Function Design
Documents
This page has links to documents dealing with TCAD and atomic scale in microelectronics
TCAD driven CAD
from Silvaco
High level TCAD representation and simulation
from TU Vienna
Challenges in predictive process simulation
ChiPPS 1997
Accuracy counts in modelling TCAD's future
Bryan A. Biegel. IEEE student magazine August/September 2000
Multi-level TCAD synthesis approach to design and optimisation of ultra-small transistors
Xing Zhou
Semiconductor process and device simulation TCAD
cyberfab.net
TCAD tools for twenty first century semiconductor modelling
Computational materials research group at SRI international.
Challenges for atomic scale modelling in alternative gatestack engineering.
Dutton group Stanford
Living in an Expanding TCAD space
. L. J. Boruki, Motorola
Ab-initio pseudopotential calculations of boron diffusion in silicon
. W. Windl, Motorola
Atomistic modelling of chemical vapour deposition (CVD): Silicon Oxynitride
. N. Tampipat (MSI), A. Korkin and A. Demkov (Motorola) and J. Andzelm (MSI)
TCAD - yesterday, today and tomorrow
. R. W. Dutton (Stanford)
